MOSFET as a Switch
1. Structure and Symbol of MOSFET
Structure and Symbol of MOSFET
The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) is a four-terminal device consisting of a gate (G), drain (D), source (S), and body (B) terminal. Its operation relies on the modulation of charge carriers in a channel formed between the drain and source via an electric field generated by the gate voltage.
Physical Structure
The MOSFET is fabricated on a semiconductor substrate (typically silicon) with the following layered structure:
- A p-type or n-type bulk substrate forms the body terminal.
- Two heavily doped regions (source and drain) of opposite polarity to the substrate.
- A thin insulating oxide layer (SiO2) separates the gate from the channel.
- A conductive gate electrode (polysilicon or metal) overlays the oxide.
Circuit Symbols
MOSFETs are represented in circuit diagrams with standardized symbols that distinguish between:
- Enhancement-mode vs. depletion-mode operation
- N-channel vs. P-channel types
Key Structural Parameters
The switching characteristics are governed by physical dimensions and material properties:
Where:
- \( C_{ox} \) = Gate oxide capacitance per unit area
- \( \epsilon_{ox} \) = Permittivity of oxide material
- \( t_{ox} \) = Oxide thickness
This equation describes the drain current in the linear region, where:
- \( \mu_n \) = Electron mobility
- \( W/L \) = Width-to-length ratio of the channel
- \( V_{th} \) = Threshold voltage
Practical Considerations
Modern power MOSFETs incorporate advanced features to optimize switching performance:
- Vertical structures (DMOS) for higher current handling
- Cell-based designs to minimize on-resistance \( R_{DS(on)} \)
- Trench gates for increased channel density
- Superjunction architectures for high-voltage applications
1.2 Working Principles of MOSFET
Basic Structure and Operation
The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) operates as a voltage-controlled switch, leveraging the modulation of charge carriers in a semiconductor channel. The primary components are:
- Gate (G): Insulated by a thin oxide layer (SiO2), it controls the channel conductivity.
- Source (S) and Drain (D): Terminals through which current flows when the channel is induced.
- Body (B): Typically connected to the source in discrete devices to eliminate body effect.
When a sufficient gate-to-source voltage (VGS) is applied, an inversion layer forms beneath the oxide, creating a conductive path between the source and drain.
Modes of Operation
MOSFETs exhibit three primary operational regions:
- Cutoff Region (VGS < Vth): No channel forms; the device acts as an open switch.
- Triode/Linear Region (VGS > Vth, VDS < VGS - Vth): Channel is fully formed, and current varies linearly with VDS.
- Saturation Region (VGS > Vth, VDS ≥ VGS - Vth): Current saturates and becomes independent of VDS.
Mathematical Derivation of Drain Current
The drain current (ID) in the triode and saturation regions is derived from the gradual channel approximation:
where μn is electron mobility, Cox is oxide capacitance per unit area, and W/L is the aspect ratio.
Switching Characteristics
As a switch, the MOSFET transitions between cutoff (OFF) and triode (ON) regions. Key parameters include:
- Threshold Voltage (Vth): Minimum VGS to form the inversion layer.
- On-Resistance (RDS(on)): Determined by channel geometry and mobility, critical for power dissipation.
- Switching Speed: Governed by gate capacitance charging time (τ = RGCiss).
Practical Considerations
In power electronics, MOSFETs are often driven in the saturation region to minimize conduction losses. However, parasitic capacitances (Cgs, Cgd, Cds) and the Miller effect can delay switching transitions. Advanced gate drivers and zero-voltage switching (ZVS) techniques mitigate these issues.
1.3 Regions of Operation: Cutoff, Triode, and Saturation
Fundamental Operating Modes
A MOSFET operates in three distinct regions depending on the bias conditions applied to its terminals. These regions—cutoff, triode (linear), and saturation—dictate the device's current-voltage characteristics and its suitability for switching or amplification.
1. Cutoff Region
In the cutoff region, the gate-source voltage VGS is below the threshold voltage VTH, preventing the formation of an inversion layer. The drain current ID is effectively zero, making the MOSFET behave as an open switch. The condition for cutoff is:
This region is critical for digital logic circuits where the MOSFET must completely block current in the OFF state. Leakage currents (subthreshold conduction) become significant in nanometer-scale devices but are often negligible in power applications.
2. Triode (Linear) Region
When VGS exceeds VTH and VDS is small, the MOSFET enters the triode region. Here, the channel acts as a voltage-controlled resistor. The drain current is given by:
Where:
- μn: Electron mobility
- Cox: Oxide capacitance per unit area
- W/L: Aspect ratio
For small VDS, the quadratic term becomes negligible, simplifying to a linear relationship. This region is exploited in analog switches and voltage-controlled resistors.
3. Saturation Region
The saturation region occurs when VDS ≥ VGS - VTH, causing channel pinch-off at the drain end. The current becomes independent of VDS and is modeled by:
Where λ is the channel-length modulation parameter. This region is essential for amplification, where the MOSFET provides high output impedance. For switching applications, the device transitions rapidly through saturation during switching transients.
Boundary Conditions and Transition Behavior
The boundary between triode and saturation is defined by:
In power electronics, minimizing time spent in saturation reduces switching losses. Modern MOSFETs achieve nanosecond-scale transitions by optimizing gate drive circuits and reducing parasitic capacitances (Cgd, Cgs).
Practical Implications for Switching
For optimal switching performance:
- Cutoff: Ensures zero static power dissipation
- Triode: Provides low ON-state resistance (RDS(on))
- Saturation: Minimized during transitions to reduce switching losses
Advanced gate driver ICs use adaptive timing to accelerate transitions through saturation, critical in high-frequency DC-DC converters (>1 MHz).
2. Switching Characteristics of MOSFET
Switching Characteristics of MOSFET
The switching behavior of a MOSFET is governed by its transient response when transitioning between the cut-off and saturation regions. Key parameters include turn-on delay (td(on)), rise time (tr), turn-off delay (td(off)), and fall time (tf). These metrics are critical in high-frequency applications, where switching losses dominate.
Gate Charge Dynamics
The gate-to-source voltage (VGS) must exceed the threshold voltage (Vth) to initiate conduction. The gate charge (QG) comprises three components:
- QGS: Charge to reach Vth
- QGD: Miller charge to overcome the gate-drain capacitance (CGD)
- QG(OV): Overdrive charge for full enhancement
Switching Time Derivation
The rise time (tr) depends on the gate resistance (RG) and input capacitance (Ciss):
where Ciss = CGS + CGD (Miller effect neglected during initial turn-on).
Miller Plateau Effect
During switching, VGS exhibits a plateau phase while discharging CGD. The duration (tplateau) is:
where IG is the gate driver current. This phase directly impacts switching losses.
Power Dissipation
Total switching losses (Psw) combine turn-on and turn-off energy:
where fsw is the switching frequency. High dV/dt and di/dt during transitions may induce voltage spikes or ringing.
Practical Considerations
- Gate Driver Selection: Must source/sink sufficient current to minimize tr and tf
- Layout Parasitics: Stray inductance increases overshoot and ringing
- Thermal Management: Switching losses raise junction temperature, affecting reliability
2.2 Gate-Source Voltage (VGS) and Threshold Voltage (Vth)
The operation of a MOSFET as a switch hinges critically on the relationship between the gate-source voltage (VGS) and the threshold voltage (Vth). When VGS exceeds Vth, the MOSFET enters the on-state, allowing significant drain current (ID) to flow. Below Vth, the device remains in cutoff, acting as an open switch.
Threshold Voltage (Vth): Definition and Physics
The threshold voltage is the minimum VGS required to form an inversion layer (conductive channel) between the source and drain. For an n-channel MOSFET, it is derived from the electrostatic balance at the oxide-semiconductor interface:
where:
- VFB is the flat-band voltage,
- φB is the bulk potential,
- q is the electron charge,
- εs is the semiconductor permittivity,
- NA is the acceptor doping concentration,
- Cox is the oxide capacitance per unit area.
Gate-Source Voltage (VGS) and Channel Formation
When VGS > Vth, the surface potential attracts minority carriers (electrons in nMOS), forming an inversion layer. The overdrive voltage (VOV = VGS - Vth) determines the inversion charge density (Qinv):
In saturation, the drain current (ID) follows the square-law model:
Practical Implications for Switching
For robust switching:
- VGS must significantly exceed Vth to minimize RDS(on) (e.g., 10V for a power MOSFET with Vth = 2V).
- Subthreshold leakage becomes critical when VGS is near Vth, especially in low-power designs.
- Temperature dependence: Vth decreases by ~2mV/°C due to intrinsic carrier concentration (ni) effects.
Real-World Considerations
In high-frequency switching applications, the Miller effect introduces a delay as VGS must first charge the gate-drain capacitance (CGD) before overcoming Vth. This is mitigated by:
- Using low-threshold MOSFETs (e.g., logic-level FETs) for 3.3V/5V gate drives.
- Implementing gate drivers to provide fast VGS transitions.
- Accounting for process variations (Vth can vary ±20% in mass production).
2.3 On-State Resistance (RDS(on)) and Its Impact
Definition and Physical Origin
The on-state resistance (RDS(on)) of a MOSFET represents the total resistance between the drain and source terminals when the device is fully turned on. It arises from the combined contributions of the channel resistance, drift region resistance, and parasitic resistances in the source, drain, and metallization layers. In modern power MOSFETs, RDS(on) is dominated by the epitaxial layer resistance, which is designed to sustain the blocking voltage in the off-state.
Mathematical Derivation
The channel resistance component can be derived from the MOSFET's I-V characteristics in the linear region. For a gate voltage VGS significantly above the threshold voltage Vth, the drain current ID is given by:
For small VDS, the quadratic term becomes negligible, and the expression simplifies to:
The channel resistance Rch is then obtained as:
The total RDS(on) includes additional resistances:
Temperature Dependence
RDS(on) exhibits a strong positive temperature coefficient due to the mobility degradation of charge carriers with increasing temperature. The relationship is approximately linear for silicon MOSFETs:
where α typically ranges from 0.6% to 1.0% per °C for modern devices. This characteristic enables natural current sharing in parallel-connected MOSFETs but also leads to higher conduction losses at elevated temperatures.
Impact on Switching Performance
The RDS(on) directly determines the conduction losses in switching applications:
For high-frequency switching circuits, the trade-off between RDS(on) and gate charge (QG) becomes critical. Devices optimized for lower RDS(on) typically exhibit higher gate capacitance, increasing switching losses. The figure of merit (FOM) for this trade-off is:
Advanced Device Structures
Modern power MOSFET technologies employ various techniques to minimize RDS(on):
- Trench gate structures increase channel density per unit area
- Superjunction designs reduce drift region resistance while maintaining voltage blocking capability
- Charge balance techniques optimize the doping profile in the epitaxial layer
Wide-bandgap devices like GaN and SiC MOSFETs achieve significantly lower RDS(on) values compared to silicon counterparts due to their higher critical electric field strength, enabling thinner drift regions.
Measurement Considerations
Accurate RDS(on) measurement requires:
- Sufficient gate drive voltage to ensure full channel enhancement
- Low drain-source voltage to avoid operation in saturation region
- Temperature stabilization to account for thermal effects
- Kelvin sensing to eliminate lead resistance errors
Modern curve tracers and power device analyzers implement pulsed measurement techniques to prevent self-heating during characterization.
3. Driving the MOSFET: Gate Drivers and Bootstrap Circuits
Driving the MOSFET: Gate Drivers and Bootstrap Circuits
Gate Drive Requirements
MOSFET switching speed and conduction losses are heavily influenced by the gate drive characteristics. The gate-source capacitance (CGS) and gate-drain capacitance (CGD, or Miller capacitance) must be charged and discharged rapidly to minimize transition times. The required gate charge (QG) is derived from the integral of the gate current:
For fast switching, the gate driver must supply sufficient peak current (IG) to overcome the capacitive load:
where VDRIVE is the gate driver output voltage, VTH is the MOSFET threshold voltage, RG is the external gate resistor, and RG(int) is the internal gate resistance.
Gate Driver ICs
Dedicated gate driver ICs are essential for high-frequency or high-power applications. Key specifications include:
- Peak output current: Typically 2A–10A for fast switching.
- Propagation delay: Critical for synchronous rectification (often <50ns).
- Isolation voltage: Required in half-bridge or full-bridge topologies.
Modern drivers integrate features like:
- UVLO (Under-Voltage Lockout) to prevent incomplete turn-on.
- Miller clamp to suppress CGD-induced turn-on.
- Adaptive dead-time control for synchronous converters.
Bootstrap Circuit Design
In high-side configurations, a bootstrap circuit maintains gate drive voltage above the source potential. The bootstrap capacitor (CBOOT) must store enough charge to keep the high-side MOSFET on during the entire conduction period:
where IBS(leak) is the bootstrap diode leakage current, tON is the maximum on-time, and ΔVBOOT is the allowable voltage droop (typically ≤10% of VDRIVE).
The bootstrap diode must withstand the full supply voltage and have fast recovery to prevent reverse charge leakage. Schottky diodes are commonly used for their low forward voltage and negligible recovery time.
Practical Considerations
- Minimum switching frequency: Bootstrap circuits require periodic refresh; frequencies below 1kHz may need auxiliary bias supplies.
- dv/dt immunity: High-side drivers must reject transient voltage spikes induced by switching edges.
- Layout: Minimize parasitic inductance in the gate loop to avoid oscillations.
3.2 Switching Speed and Switching Losses
Switching Speed Fundamentals
The switching speed of a MOSFET is determined by how quickly the device transitions between the cut-off and saturation regions. This speed is primarily governed by the time required to charge or discharge the gate capacitance (CGS and CGD). The total switching time (tsw) consists of two phases:
- Turn-on delay (td(on)) — Time taken for the gate voltage to reach the threshold voltage (VTH).
- Rise/fall time (tr, tf) — Time for the drain current or voltage to transition between 10% and 90% of its final value.
Gate Drive and Switching Speed
The switching speed is heavily influenced by the gate driver's current capability. A higher gate drive current (IG) reduces the RC time constant of the gate circuit, speeding up the transition:
where Qg is the total gate charge. However, excessively fast switching can lead to voltage overshoot and ringing due to parasitic inductances in the circuit.
Switching Losses
Switching losses occur during the transient periods when the MOSFET is neither fully on nor off, resulting in simultaneous high voltage and current. The energy dissipated per switching cycle (Esw) is given by:
where fsw is the switching frequency. Total power loss (Psw) scales linearly with frequency:
Impact of Parasitic Elements
Parasitic capacitances (Coss, Crss) and inductances (Ls, Ld) in the MOSFET and PCB layout contribute to switching losses. The Miller effect (due to CGD) further slows down switching by effectively increasing the input capacitance during the VDS transition.
Optimizing Switching Performance
To minimize losses while maintaining acceptable switching speed:
- Use a low-resistance gate driver to reduce tr and tf.
- Select MOSFETs with low Qg and low RDS(on).
- Implement snubber circuits to dampen ringing without significantly increasing losses.
- Optimize PCB layout to minimize parasitic inductances.
Trade-offs in High-Frequency Applications
At high frequencies (fsw > 1 MHz), switching losses dominate over conduction losses. Designers must balance:
- Faster switching (reduced overlap losses but increased EMI).
- Slower switching (lower EMI but higher dissipation).
Advanced techniques like zero-voltage switching (ZVS) or zero-current switching (ZCS) can eliminate switching losses but require resonant topologies.
3.3 Heat Dissipation and Thermal Management
When a MOSFET operates as a switch, power dissipation occurs primarily in two modes: conduction losses (I²R) and switching losses. The total power dissipated (Pdiss) is the sum of these components:
where ID is the drain current, RDS(on) is the on-state resistance, VDS is the drain-source voltage during switching, tr and tf are the rise and fall times, and fsw is the switching frequency.
Thermal Resistance and Junction Temperature
The MOSFET's junction temperature (TJ) must be kept within safe limits to prevent thermal runaway or device failure. The thermal path from junction to ambient is characterized by thermal resistances:
where:
- TA = ambient temperature
- RθJC = junction-to-case thermal resistance (device-dependent)
- RθCS = case-to-sink thermal resistance (depends on interface material)
- RθSA = sink-to-ambient thermal resistance (depends on heatsink design)
Practical Thermal Management Techniques
Effective heat dissipation requires optimizing multiple factors:
1. Heatsink Selection
The heatsink's thermal resistance must be low enough to maintain TJ below the maximum rated value (typically 150–175°C for silicon MOSFETs). Forced air cooling can reduce RθSA by 30–50% compared to natural convection.
2. Thermal Interface Materials (TIMs)
Thermal grease, pads, or phase-change materials fill microscopic gaps between the MOSFET case and heatsink, minimizing RθCS. Typical values range from 0.3°C/W (high-performance grease) to 1.5°C/W (silicone pads).
3. PCB Layout Considerations
For surface-mount devices, thermal vias and copper pours act as extended heatsinks. A 2 oz/ft² copper plane with multiple vias can achieve RθJA as low as 20°C/W without external heatsinks.
Transient Thermal Analysis
Under pulsed operation, the thermal time constant (τth) of the package determines how quickly heat spreads:
where Cth is the thermal capacitance. For short pulses (tpulse << τth), the effective thermal resistance is reduced:
This explains why MOSFETs can handle higher peak currents in pulsed applications compared to DC operation.
Advanced Cooling Methods
For high-power applications (>500W), liquid cooling or heat pipes may be necessary. These can achieve RθSA values below 0.1°C/W, enabling power densities exceeding 100W/cm².
4. Power Supply Switching
4.1 Power Supply Switching
MOSFETs are widely employed in power supply switching due to their low on-resistance (RDS(on)), fast switching speeds, and high efficiency. When operating as a switch, a MOSFET transitions between the cutoff and saturation regions, effectively controlling the flow of current in a power circuit. The gate-source voltage (VGS) determines the conduction state, with the threshold voltage (Vth) serving as the critical switching point.
Switching Dynamics and Power Dissipation
The total power dissipation in a MOSFET during switching consists of conduction losses (Pcond) and switching losses (Psw). Conduction losses occur when the device is fully on and are given by:
Switching losses arise during the transient periods when the MOSFET is neither fully on nor off. These losses depend on the switching frequency (fsw), drain-source voltage (VDS), drain current (ID), and the rise (tr) and fall (tf) times:
Gate Drive Considerations
Efficient switching requires careful gate drive design. The gate charge (QG) must be fully delivered to ensure the MOSFET reaches the desired VGS. The gate driver must supply sufficient current (IG) to charge the input capacitance (Ciss) quickly:
In high-frequency applications, parasitic inductances and capacitances can lead to ringing and increased losses. Proper PCB layout, including minimized gate loop inductance and use of low-resistance gate resistors, is critical.
Thermal Management
Power dissipation raises the junction temperature (TJ), which must be kept within safe limits. The thermal resistance from junction to ambient (RθJA) determines the temperature rise for a given power dissipation:
Heat sinks or forced air cooling may be necessary for high-power applications to maintain reliable operation.
Practical Applications
MOSFETs are extensively used in DC-DC converters, motor drives, and switched-mode power supplies (SMPS). For example, in a buck converter, the MOSFET switches at high frequency to regulate the output voltage. The choice of MOSFET depends on voltage rating, current handling, and switching speed requirements.
Advanced designs often incorporate synchronous rectification, where a second MOSFET replaces the freewheeling diode to reduce conduction losses further. This technique is prevalent in modern power supplies aiming for efficiencies above 90%.
4.2 Motor Control Circuits
MOSFET-based motor control circuits leverage the transistor's fast switching capabilities and low on-resistance to efficiently regulate the speed and direction of DC motors. The fundamental topology consists of a MOSFET in series with the motor, driven by a gate signal that switches between saturation and cutoff regions.
Basic PWM Motor Drive Circuit
The most common approach uses pulse-width modulation (PWM) to control average motor current. When the MOSFET is in saturation (VGS > VTH), the motor sees the full supply voltage. During the off-state (VGS = 0), the motor's inductive kickback must be managed through a freewheeling diode. The duty cycle D of the PWM signal directly controls the motor's effective voltage:
where D = ton/T (with T being the PWM period). The resulting average motor current is:
where EMF is the back-electromotive force and Rwind is the motor winding resistance.
Gate Drive Considerations
Motor control requires careful gate drive design due to:
- High peak currents during turn-on when charging the gate capacitance
- Miller plateau effects that can cause unintended conduction
- Voltage transients from inductive switching
The required gate drive current IG is determined by:
where Qg is the total gate charge from the datasheet and tr is the desired rise time. For motors drawing >1A, dedicated gate driver ICs (e.g., TC4427) are typically employed.
Thermal Design
Power dissipation in the MOSFET comes from two primary sources:
- Conduction losses: Pcond = IRMS2 \cdot RDS(on)
- Switching losses: Psw = \frac{1}{2} V_{DS} I_D (t_r + t_f) f_{PWM}
The junction temperature can be estimated using the thermal impedance RθJA:
Protection Circuits
Essential protection mechanisms include:
- Schottky diodes for reverse EMF suppression
- TVS diodes for voltage spike protection
- Current sensing resistors with comparator feedback
- RC snubber networks across drain-source terminals
For bidirectional control, H-bridge configurations using four MOSFETs (arranged as two complementary pairs) allow both speed and direction control while maintaining proper shoot-through protection through dead-time insertion in the gate drive signals.
4.3 PWM (Pulse Width Modulation) Applications
Fundamentals of PWM Switching
Pulse Width Modulation (PWM) is a technique where the duty cycle of a square wave is modulated to control the average power delivered to a load. When a MOSFET operates as a switch in PWM applications, it transitions rapidly between cutoff and saturation regions, minimizing power dissipation during switching. The average output voltage Vavg is given by:
where D is the duty cycle (0 ≤ D ≤ 1) and VDD is the supply voltage. The switching frequency fsw must be high enough to avoid visible flicker in lighting applications or audible noise in motor control, typically ranging from 20 kHz to several MHz.
MOSFET Switching Losses in PWM
Power dissipation in a PWM-driven MOSFET consists of conduction losses (Pcond) and switching losses (Psw):
where tr and tf are the rise and fall times, respectively. For high-efficiency designs, fsw is optimized to balance between switching losses and ripple current.
Gate Drive Considerations
Fast switching requires low-impedance gate drive circuits to minimize transition times. The required gate drive current IG is:
where Qg is the total gate charge specified in the MOSFET datasheet. Insufficient drive current leads to excessive switching losses due to prolonged transition through the linear region.
Practical Applications
Motor Speed Control
In brushed DC motors, PWM regulates speed by varying the average voltage while maintaining torque. The back-EMF (Vemf) of the motor acts as a natural low-pass filter, smoothing the current ripple:
where ke is the back-EMF constant and ω is the angular velocity.
LED Dimming
PWM dimming preserves LED chromaticity by operating at either zero or nominal current, avoiding the spectral shift associated with analog dimming. A typical LED driver circuit uses a high-side MOSFET switch with a freewheeling diode for inductive kickback protection.
Switch-Mode Power Supplies
Buck and boost converters rely on PWM to regulate output voltage. The duty cycle controls the energy transfer to the output capacitor and load. For a buck converter in continuous conduction mode (CCM), the output voltage is:
Critical design parameters include inductor selection (L > Lcrit) to maintain CCM and output capacitor sizing to limit voltage ripple.
Dead-Time Insertion
In half-bridge or full-bridge configurations, dead-time (tdead) prevents shoot-through current during MOSFET switching transitions. The dead-time must exceed the sum of the turn-off delay (td(off)) and the turn-on delay (td(on)) of the complementary MOSFETs:
Modern gate drivers integrate programmable dead-time generators to optimize this parameter dynamically.
5. Recommended Books and Papers
5.1 Recommended Books and Papers
- PDF Fundamentals of Ultra-Thin-Body MOSFETs and FinFETs — 1.1.1 Planar FD/SOI MOSFET 5 1.1.2 FinFET 5 1.2 Brief overview of the book 9 2 Unique features of UTB MOSFETs 13 2.1 Long-channel threshold voltage 15 2.1.1 The depletion approximation 15 2.1.2 Review of the classical charge-coupling model 16 2.1.3 Nonclassical model 17 2.1.4 Applications 22 2.1.5 Generalized charge coupling 23
- 5: MOS Capacitor and MOSFET - Semiconductor Devices: Physics and ... — 5 MOS Capacitor and MOSFET 5.1 IDEAL MOS CAPACITOR 5.2 SIO2-SI MOS CAPACITOR 5.3 CARRIER TRANSPORT IN MOS CAPACITORS 5.4 CHARGE-COUPLED DEVICES 5.5 MOSFET FUNDAMENTALS SUMMARY The metal-oxide-semiconductor … - Selection from Semiconductor Devices: Physics and Technology, 3rd Edition [Book]
- PDF CHAPTER 5 MOS FIELD‐EFFECT TRANSISTORS (MOSFETs) — NTUEE Electronics -L. H. Lu 5‐1 CHAPTER 5 MOS FIELD‐EFFECT TRANSISTORS (MOSFETs) Chapter Outline 5.1 Device Structure and Physical Operation 5.2 Current‐Voltage Characteristics 5.3 MOSFET Circuits at DC 5.4 Applying the MOSFET in Amplifier Design 5.5 Small‐Signal Operation and Models
- Avoid Common Mistakes When Selecting And Designing With Power MOSFETs — > 1. This makes the MOSFET more susceptible to CdV/dt induced turn-on when used as the low side FET in a synchronous buck converter. Similarly, the CSD18541F5 has a charge ratio > 1, but the typical internal series gate resistance is R. G = 1200Ω. This limits the switching speed and this FET is not the best for switch-mode applications.
- MOSFETs: Structure, Operation & Applications - studylib.net — The MOSFET parameter VA depends on the process technology and, for a given process, is proportional to the channel length L. 5.2.5. Characteristics of the p-channel MOSFET Characteristics of the pchannel MOSFET are similar to the n-channel, however with many signs reversed. Please review section 5.2.5 from the text, with focus on table 5.2.
- PDF Advanced Power MOSFET Concepts - download.e-bookshelf.de — In the 1970s, the power MOSFET product was first introduced by International Rectifier Corporation. Although initially hailed as a replacement for all bipolar power devices due to its high input impedance and fast switching speed, the silicon power MOSFET has successfully cornered the market for low voltage (<100 V)
- PDF Chapter 5 MOSFETs - Springer — of MOSFET parameters and data analysis techniques are covered in Chapter 10. Extraction of MOSFET properties from circuit delay measurements is described in Chapter 6. 5.1.1 MOSFET DC I-V Characteristics ... 0.0 0.5 1.0 V ds V g3 V g2 V g1 (d) n-FET p-FET 1.0 0.0 I ds
- A Taxonomical Review of MOS Power Transistor for Electronic ... - Springer — The power MOSFET is used in the electronic circuitry of the computer mother motherboard as a switch, the MOSFET allows the current from the source to pass when there is a gate current, and acts as an off switch if the gate current is zero. It is used in the heavy machinery in industries where we need to switch heavy currents.
- PDF Gate drive for power MOSFETs in switching applications — Figure 2 Power MOSFET parasitic components Note: LTO = lithium titanate oxide When a voltage is applied between the gate and source terminals, an electric field is set up within the MOSFET channel region. This field inverts the channel from P to N, enabling a current to flow from drain to source in
- PDF Microelectronic Circuits I Ch 5 MOS Field-Effect Transistors (MOSFETs) — CNU EE 5.1-5 Creating a Channel for Current Flow +vGS e-e-h+h+h+h+e-e- +vGS e-e-e-e-e-e-e-e- §When vGS> 0, vDS= 0 (Source, Drain & Body are grounded) §Mechanism for Channel induction: -vGS> 0 àHoles at the channel region are pushed downward into the substrate. -A carrier depletion region at the channel region àuncovered negative charges
5.2 Online Resources and Datasheets
- PDF Power MOSFET - Vishay Intertechnology — * This datasheet provides information about parts that are RoHS-compliant and / or parts that are non RoHS-compliant. ... N-Channel MOSFET G D S TO-220AB G S Available Available Available ORDERING INFORMATION Package TO-220AB ... 1.5 2.0 2.5 - 60- 40- 20 0 20 40 60 80 100 120140 160 T J, Junction Temperature (°C) R
- SSZTCH1 Technical article | TI.com - Texas Instruments — understanding mosfet data sheets, part 5 - switching parameters. ssztch1 july 2015 csd18531q5a 1 2 3; technical article. ... (including datasheets), design resources (including reference designs), application or other design advice, web tools, safety information, and other resources "as is" and with all faults, and disclaims all ...
- PDF CHAPTER 5 MOS FIELD‐EFFECT TRANSISTORS (MOSFETs) — 5.3 MOSFET Circuits at DC 5.4 Applying the MOSFET in Amplifier Design 5.5 Small‐Signal Operation and Models 5.6 Basic MOSFET Amplifier Configurations ... NTUEE Electronics -L. H. Lu 5‐2. Operation with zero gate voltage The MOS structure form a parallel‐plate plate capacitor with gate oxide layer in the middle Two pn junctions ...
- ALLDATASHEET.COM - Electronic Parts Datasheet Search — ALLDATASHEET.COM is the biggest online electronic component datasheets search engine. - Contains over 50 million semiconductor datasheets. - More than 60,000 Datasheets update per month. - More than 460,000 Searches per day. - More than 28,000,000 Impressions per month.
- MOSFET as a Switch - Electronics Hub — A practical switch experiences power loses during on state, off state and also during the transition state (on to off or off to on). Working of a MOSFET as a Switch. If you understood the working of the MOSFET and its regions of operation, you would have probably guessed how a MOSFET works as a switch.
- MOSFET Theory & Applications: Chapter 5 - studylib.net — Figure 5.21: ac circuit of a drain feedback common source amplifier Using equation (5.4), which is I D = K[VGS − VGS( th ) ]2 The drain current ID is I D = 0.125mA / V 2 [VGS − 1.5]2 Also, the drain voltage VDS is VDS = 15V - ID x 10.0kΩ. - 157 - 5 MOS Transistor Theory and Applications Since there is no current flow into the gate, the ...
- MOSFET Support and Training Tools (Rev. F) - Texas Instruments — What s not in the power MOSFET data sheet, part 1: temperature dependency. dependency. What s not in the power MOSFET data sheet, part 2: voltage-dependent leakage currents. dependent leakage currents. Tips for successfully paralleling power MOSFETs. Solving Assembly Issues with Chip Scale Power MOSFETs. Using MOSFET SOA curves in your design
- PDF Chapter 5 MOSFET 5.2 MOSFET Transistor - SJTU — Prepared by Xiulan Cheng/程秀兰 "Pull-Down"and "Pull-Up"Devices In CMOS logic gates, NMOSFETs are used to connect the output to GND, whereas PMOSFETs are used to connect the output to V DD. An NMOSFET functions as a pull-down device when it is turned on (gate voltage = V DD) A PMOSFET functions as a pull-up device when it is turned on (gate voltage =
- Avoid Common Mistakes When Selecting And Designing With Power MOSFETs — = 250µA in TI FET data sheets. This is where the FET just begins to conduct current and is lower than the minimum V. GS. where R. DS(on) is specified in the data sheet. For example, as shown in Table 4-4, typical V. GS(th) = 1.75V for the CSD18541F5 60V N-channel FET but the minimum V. GS = 4.5V where R. DS(on) is specified in the data sheet ...
- MOSFET as a Switch - Using Power MOSFET Switching — The operation of the enhancement-mode MOSFET, or e-MOSFET, can best be described using its I-V characteristics curves shown below. When the input voltage, ( V IN) to the gate of the transistor is zero, the MOSFET conducts virtually no current and the output voltage ( V OUT) is equal to the supply voltage V DD.So the MOSFET is "OFF" operating within its "cut-off" region.
5.3 Advanced Topics and Research Directions
- Advanced Nanoscale MOSFET Architectures - Wiley Online Library — v Contents About the Editors xi List of Contributors xiii Preface xvii Acknowledgments xix 1 Emerging MOSFET Technologies 1 Kalyan Biswas and Angsuman Sarkar 1.1 Introduction:TransistorAction 1 1.2 MOSFETScaling 1 1.3 ChallengesinScalingtheMOSFET 2 1.4 EmergingMOSFETArchitectures 3 1.4.1 TunnelFET 3 1.4.2 NanowireFET 4 1.4.3 NanosheetFET 5 1.4.4 NegativeCapacitanceFET 6 1.4.5 GrapheneFET 7
- Advancement and challenges in MOSFET scaling - ScienceDirect — CSDG MOSFET was analysed by TCAD and this analysis comprising an inner charge control gate was presented. The CSDG MOSFET evolved as an improvised electrostatic integrity with better RF efficiency. More than 2.3 THz cut off frequency has been achieved. The noise model and drain current of CSDG MOSFET for RF switch has been analysed.
- PDF Advanced MOSFET Structures and Processes for Sub-7 nm CMOS Technologies — The yield of six-transistor (6-T) SRAM cells implemented with these advanced MOSFET structures is then investigated via a calibrated physically based compact model. The benefits of GAA MOSFET technology for lowering the minimum operating voltage (V min) and area of 6-T SRAM cells to facilitate increased transistor density following Moore's
- MOSFET Theory & Applications: Chapter 5 - studylib.net — Figure 5.7: ID - VDS characteristic curve of an n-channel MOSFET There are two equations of the transfer characteristics for enhancement MOSFET. At linear region, the equation is 1 2 I D = 2K (VGS − VGS( th ) )VDS − VDS 2 (5.3) This equation is useful for MOSFET operating as a switch or digital device.
- CHAPTER 5 MOS FIELD‐EFFECT TRANSISTORS (MOSFETs) — 5.3 MOSFET Circuits at DC 5.4 Applying the MOSFET in Amplifier Design ... 5.9 The Body Effect and Other Topics. 5.1 Device Structure and Physical Operation Device structure of MOSFET "MOS" ≡metal‐oxide‐semiconductor structure MOSFET is a four‐terminal device: gate (G), source (S), drain (D) and body (B) ... NTUEE Electronics -L. H ...
- PDF Chapter 5 Modern MOS-Based Power Device Technologies in ... - Springer — MOSFET is depicted and compared to the bipolar junction transistor. The operation principle of lateral power MOSFETs is reviewed including forward, reverse and switching operation. Then, different design concepts that have enabled the break-through for lateral power MOSFETs are presented: A key element of modern lateral
- PDF Technologies for enhancing multi-gate Si MOSFET performance — in enhanced carrier mobilities. However, these advanced device structures will likely require a metal gate technology that offers tunable work function to allow for threshold voltage (VT) adjustment for proper CMOS circuit operation. Strained-Si has also been considered as a key technology for enhancing carrier mobilities via modification of the
- PDF CMOS Analog Design Using All-Region MOSFET Modeling — 2 Advanced MOS transistor modeling 26 2.1 Fundamentals of the MOSFET model 26 2.1.1 Electrons and holes in semiconductors 26 2.1.2 The two-terminal MOS structure 28 2.1.3 Accumulation, depletion, and inversion (for p-type substrates) 31 2.1.4 The small-signal equivalent circuit of the two-terminal MOS (for p-type substrates) 32
- PDF Advanced MOSFET Designs and Implications for SRAM Scaling — Advanced MOSFET Designs and Implications for SRAM Scaling By Changhwan Shin A dissertation submitted in partial satisfaction of the requirements for the degree of
- PDF Thesis Final Revision - Griffith University — Material Advantages of SiC for Power Electronic Devices 1-1 1.2. Need for Suitable MOSFET Structure in SiC 1-3 1.3. Thesis Outline 1-5 ... NOVEL ACCUFET IN SWITCH-MODE POWER SUPPLY SYSTEM 4-1 4.1. Introduction 4-1 ... Suggestion for Further Research 5-3 . vi APPENDIX A: FUNDAMENTALS OF SiC DEVICE PROCESSING AND ...